HEX Mini

THE HEX SERIES HEX CLUSTER HEX MINI HEX UHV APPLICATIONS INSIGHTS Linkedin Youtube The HEX Series Why the HEX Series? HEX vs HEX-L vs HEX-XL HEX Steel Deposition Sources FISSION – Magnetron Sputtering TES – Thermal Boat Evaporation TAU – Electron Beam Evaporation ORCA – Low Temperature Evaporation Sample Stages Glovebox Integration Automation Software Customisations HEX Cluster HEX MINI HEX UHV HEX UHV TAU UHV Applications Thin-Film Solar Cells Optical Coatings Thin-Film Batteries Teaching and Training Reactive Sputtering Sample Preparation Lift-off ITO Coatings Insights Webinars Techniques Articles Videos Testimonials Publications About Us THE HEX MINI Single Source Desktop PVD Coater The HEX Mini is Korvus Technology’s compact, entry-level PVD (physical vapour deposition) system for the production of thin films. Applications include optical coatings, sample preparation for SEM/TEM and electrical contacts. A “plug-and-play” deposition system with quick setup times, HEX Mini offers researchers in materials science, physics and microscopy the ability to make high-quality coatings in a compact and user-friendly system, without compromising performance. The benchtop HEX Mini can be configured with either a 2” DC (direct current)sputtering source or a thermal evaporation source. Choice of deposition method will depend on users’ material, desired yield, uniformity and sample sensitivity. MINI S MINI T Mini-T Turbopumped Thermal Evaporation System Maximum Sample Size Diameter: 2" (50mm) Source: TES Thermal Evaporator Power Supply: 720W, 72A / 10V Base Pressure: <5×10-6 mbar* Chamber Volume: 3 L Optional Thickness Monitoring *Ultimate base pressure is on factory tested systems. Subsequent base pressure depends on a variety of factors such as chamber cleanliness, user operation and lab environment. Mini-S Turbopumped DC Sputter System Maximum Sample Size (Diameter): 2" (50mm) Source: DC Sputtering Magnetron Sputter Size (Diameter): 2" Power Supply: 208W, 650V / 0.32A Base Pressure: <5×10-6 mbar* Chamber Volume: 3 L *Ultimate base pressure is on factory tested systems. Subsequent base pressure depends on a variety of factors such as chamber cleanliness, user operation and lab environment. Mini-T Turbopumped Thermal Evaporation System Maximum Sample Size Diameter: 2" (50mm) Source: TES Thermal Evaporator Power Supply: 720W, 72A / 10V Base Pressure: <5×10-6 mbar* Chamber Volume: 3 L Optional Thickness Monitoring HEX Mini FAQs What Are The Applications Of The HEX Mini? Applications of the HEX Mini include: SEM sample preparation (Sputtering & Carbon Evaporation) X-Ray Microanalysis sample preparation (Carbon Evaporation) High resolution sample preparation High purity metal contacts Semiconductors Geology Forensics Material science Medicine Life science What Is The Difference Between The Mini-S And Mini-T? Can The HEX Mini Be Used For SEM Coating? What Is The Key Difference Between The Benchtop HEX And The HEX Mini? The HEX Series of thin film deposition systems provide a unique, versatile range of deposition options for your research and implementation applications. No matter where your research takes you, the HEX Series will be by your side. At Korvus Technology we take your privacy seriously. Unit 1 Barnes Wallis Court Cressex Business Park Wellington Road, High Wycombe, Buckinghamshire, HP12 3PS sales@korvustech.com +44 1280 852096 © 2026 Korvus Technology | All Rights Reserved | Web Design by JWD