scia Coat 500
Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...
广西科米瑞实验仪器设备有限公司提供 scia Systems scia Coat 500 产品资料、选型咨询、供货报价和售后服务支持,价格面议。
← 返回产品列表
Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...
Ion Beam Etching
Ion Beam Trimming
Ion Beam Sputtering
scia Cluster 200
Technologies
Applications Application Notes White Paper Publications Research Projects Learning
Application Notes
White Paper
Publications
Research Projects
Learning
Company About us News Events
About us
Contact Head Office Worldwide Visit us
Head Office
Worldwide
Visit us
scia-jobs.de
Large Area Multilayer Deposition
The scia Coat 500 is used for homogeneous coating of large substrates for precision optics. Recipe controlled deposition processes allow a repeatable quality of multilayer stacks. Thereby, a changeable shaper system (up to 4 shapers) compensates parameter and/or material dependent inhomogeneity effects and enables the deposition of defined gradient films.
Features & Benefits
Excellent uniformity due to linear movement
Up to 6 water-cooled target materials on a rotational holder for in-situ change
Recipe controlled multilayer deposition with quartz crystal oscillator and/or optical thickness monitor (OTM)
Controlled movement of linear axis system for gradient coating or surface error correction
Optional substrate heating up to 250 °C to optimize film stress
Need more Information? Contact us!
Applications
X-ray reflectivity measurement and fitting curve of a [C+Ni]80-multilayer stack. Visibility of 4th order Bragg peak shows the excellent repeatability of single layer thicknesses.
Multilayer films for optical filters, X-ray mirrors and synchrotron mirrors
Optical coatings for high- and anti-reflective and dielectric layers
Deposition of films with property gradients (Göbel mirrors)
Ion beam smoothing
One-dimensional ion beam figuring
Application Note
Dielectric Coatings on large substrates
High- and Anti-Reflective Coatings with Ta 2 O 5 and SiO 2
Principle
Primary source sputters material from a target to the face-down oriented substrate
| 型号 | scia Coat 500 |
|---|---|
| Product category | Ion Beam Sputtering |
| Substrate size (up to) | 500 mm x 300 mm, 300 mm dia. for rotation |
请填写必填信息,我们将在工作日尽快回复。
| Substrate holder | Linear movement from 0.1 mm/min up to 15 mm/s, rotation up to 300 rpm (max. 300 mm dia.) |
|---|
| Ion beam sources | Two 380 mm linear microwave ECR sources (LIN380-e) |
|---|
| Neutralizer | Filament driven plasma bridge neutralizer (N-DC) |
|---|
| Target holder | Target drum with up to 6 tiltable and water cooled-targets (each max. 400 mm x 200 mm) |
|---|
| Base pressure | < 5 x 10 -8 mbar |
|---|
| System dimension (W x D x H) | 3.30 m x 1.70 m x 2.00 m (without electrical rack and pumps) |
|---|
| Configurations | Single chamber, optional single substrate load lock for substrates up to 200 mm dia. |
|---|
| Software interfaces | SECS II / GEM, OPC |
|---|
| Typical deposition rate | Si: 10 nm/min |
|---|
| Uniformity variation | ≤ 0.5 % over 200 mm dia. (σ/mean) ≤ 2.0 % over 500 mm x 300 mm (σ/mean) |
|---|