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scia Magna 400 / 500 / 700 / 1200

scia Magna 400

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

品牌: scia Systems价格: 面议服务区域: 全国

广西科米瑞实验仪器设备有限公司生产销售 scia Systems scia Magna 400,可提供产品参数、报价和售后服务咨询,价格面议。

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scia Magna 400 / 500 / 700 / 1200

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

Ion Beam Etching

Ion Beam Trimming

Ion Beam Sputtering

scia Cluster 200

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Multilayer Coatings for Optical Substrates

The scia Magna series includes advanced magnetron sputtering systems designed for high-precision multilayer coatings on optical substrates, achieving (sub-)nanometer accuracy. Each system can be equipped with up to six magnetrons, allowing the deposition of complex multilayer stacks from different target materials without the need to break vacuum. The systems support the deposition of metal, oxide, and nitride layers with equal efficiency.

Equipped with automated substrate handling, the scia Magna 400 Inline , scia Magna 500 Inline , scia Magna 700 Inline and scia Magna 1200 Inline enable fully automated, recipe-driven processing. Precise, position-controlled substrate motion enables defined gradient layers and superior deposition uniformity.

Features & Benefits

Multilayer coating with inline arrangement of multiple process sources

Uniform or gradient films on optical substrates by synchronized linear movement and spin rotation

Up to 6 magnetron sputter sources

Optional surface treatment by ion source or additional ion beam source

Vertical substrate orientation for minimized particle load

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Applications

Alternating stack of (Si/Mo) 23 for Bragg mirror. The results show very reproducible thicknesses of each period.

Gradient multilayer coatings of mirrors for EUV

Multilayer stacks for X-ray mirrors for beam line and analytic applications

Multilayer coating for UV and VIS optics

Principle

Inline arrangement with 6 magnetron sputter sources

Linear substrate movement past magnetrons and superimposed substrate rotation

Magnetron Sputtering utilizes plasma ion bombardment on a target to deposit thin films on the substrate surface.

Detailled Information

Substrate size (up to)

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