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scia Mill 150

scia Mill 150

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

品牌: scia Systems价格: 面议服务区域: 全国

广西科米瑞实验仪器设备有限公司生产销售 scia Systems scia Mill 150,可提供产品参数、报价和售后服务咨询,价格面议。

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scia Mill 150

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

Ion Beam Etching

Ion Beam Trimming

Ion Beam Sputtering

scia Cluster 200

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Full Surface Ion Beam Etching on 150 mm Substrates

The scia Mill 150 is designed for structuring of complex multilayers of various materials. With its fully reactive gas compatibility the system also enables reactive etching processes with enhanced selectivity and rate. Due to its space saving design the scia Mill 150 is ideal for small scale production and R&D applications.

Features & Benefits

Etching angle adjustment with tiltable and rotatable substrate holder

Excellent uniformity without shaper

Enhanced selectivity and rate with reactive gases

Process control with exact SIMS based or optical end point detection

Carrier concept for adaptation to variable substrate sizes

Processing of wafers with photoresist masks due to good wafer cooling

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Single chamber with single substrate load lock

Single chamber with load lock, SIMS and heating jacket for reactive processes

Installation through clean room wall

Applications

SEM pictures of etching edge with courtesy of DIAS Infrared GmbH.

Etching of 15 µm lithium tantalate with photoresist and 15° angle of incidence for a pyroelectric sensor.

Left: Standard photoresist mask with sharp edges.

Right: Optimized photoresist with smooth edges improves electrical bonding of the sensor.

Structuring of magnetic memory (MRAM) and sensors (GMR, TMR, etc.)

Structuring of metals (Au, Ru, Ta, …), piezoelectric, and dielectric materials (PZT, KNN, AlScN, InP, Cu, Pt, Au, ...), e.g., for MEMS production

Delayering of multilayer structures for failure analysis

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