中文English
科米瑞
首页联系我们
  1. 首页
  2. 产品中心
  3. 产品详情
科米瑞

© Copyright 科米瑞 2026

产品中心全量目录应用领域知识中心常见问题联系我们隐私政策桂ICP备2020008265号-5
广西科米瑞实验仪器设备有限公司13422079856122816084@qq.com
分析检测仪器生命科学仪器显微成像与光学样品前处理温控加热与制冷真空泵阀与流体科米瑞仪器应用领域实验室仪器选型

scia Mill 200

scia Mill 200

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

品牌: scia Systems价格: 面议服务区域: 全国

广西科米瑞实验仪器设备有限公司生产销售 scia Systems scia Mill 200,可提供产品参数、报价和售后服务咨询,价格面议。

立即询价查看更多详情咨询该型号
← 返回产品列表
scia Mill 200

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

Ion Beam Etching

Ion Beam Trimming

Ion Beam Sputtering

scia Cluster 200

Technologies

Applications Application Notes White Paper Publications Research Projects Learning

Application Notes

White Paper

Publications

Research Projects

Learning

Company About us News Events

About us

Contact Head Office Worldwide Visit us

Head Office

Worldwide

Visit us

scia-jobs.de

Full Surface Ion Beam Etching on 200 mm Wafers

The scia Mill 200 is designed for structuring of complex multilayers of various materials. For an exact process control different end point detection systems can be equipped. With its fully reactive gas compatibility the system enables reactive etching processes with enhanced selectivity and rate. The flexible design of the scia Mill 200 allows to adapt it as single substrate version as well as in high volume production cluster layout with up to three process chambers and two cassette load locks.

Features & Benefits

Etching angle adjustment with tiltable and rotatable substrate holder

Excellent uniformity without shaper

Enhanced selectivity and rate with reactive gases

Process control with exact SIMS based or optical end point detection

Processing of wafers with photoresist masks due to good wafer cooling

Fully automatic cassette handling in variable cluster layouts including SECS/GEM communication

Need more Information? Contact us!

Cluster layout with 3 process chambers and cassette handling

Cluster layout with 2 process chambers and cassette handling

Single chamber with single substrate load lock

Single chamber with cassette handling

Applications

Etching of a layer stack for a spintronic sensor using SIMS spectrometry, allows to determine the layer change boundaries, thereby changing points for angle and etch stops can precisely be defined. Left: Layer stack. Right: SIMS material detection.

Structuring of magnetic memory (MRAM) and sensors (GMR, TMR, etc.)

Structuring of metals (Au, Ru, Ta, …), piezoelectric, and dielectric materials (PZT, KNN, AlScN, InP, Cu, Pt, Au, ...), e.g., for MEMS production

Delayering of multilayer structures for failure analysis

Patterning of waveguides (LiNbO 3 , BTO, …) for Photonic Integrated Circuits (PIC)

Production of slanted surface relief gratings (SRG) for Augmented Reality

相关产品

EFT-60

Eft-60 NMR Spectrometers

EFT-60

Eft-90 NMR Spectrometers

Eft-90 NMR Spectrometers

EFT-90

SC-1

SC-1 Robotic Sample Changer

SC-1

PHERAstar FSX

PHERAstar FSX

PHERAstar FSX

CLARIOstar Plus

CLARIOstar Plus

CLARIOstar Plus

VANTAstar

VANTAstar

VANTAstar

提交需求

请填写必填信息,我们将在工作日尽快回复。