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scia Multi 300

scia Multi 300

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

品牌: scia Systems价格: 面议服务区域: 全国

广西科米瑞实验仪器设备有限公司生产销售 scia Systems scia Multi 300,可提供产品参数、报价和售后服务咨询,价格面议。

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scia Multi 300

Products Ion Beam Etching Ion Beam Trimming Ion Beam Sputtering scia Cluster 200 more...

Ion Beam Etching

Ion Beam Trimming

Ion Beam Sputtering

scia Cluster 200

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Multilayers by Magnetron Sputtering on 300 mm Wafers

The scia Multi 300 is designed to produce high quality multilayer coatings on wafers up to 300 mm by magnetron sputtering . The system can be equipped with up to 4 magnetrons, enabling high-precision multilayer stacks of up to 4 target materials without breaking the vacuum. The deposition of metal layers is just as possible as oxide and nitride layers. The cassette load lock with automatic substrate transfer and the system control ensures a completely automatic and recipe-controlled process.

Features & Benefits

Excellent uniformity over 300 mm substrate area

Synchronized orbital and spin rotation for uniform multilayer films on wafers

4 magnetrons, each with individual gas supply and shutter unit

Automatic cassette handling system with load lock

Substrate face-down orientation for minimized particle load

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Applications

Application Example: Manufacturing of GMR sensors by HZDR: Samples prepared on different substrate materials lead to the same sensor performance.

Left Picture: View of sensor under an angle with electron microscopy | Right: Comparison of several magneto-resistance curves on different substrate types

Gradient multilayer coatings of mirrors for soft X-ray and anti-reflective coatings

Multilayer stacks for EUV and X-ray mirrors

GMR and TMR based multilayer coatings

Multilayer coating for UV and VIS optics

Principle

Circular substrate movement across magnetrons, each orbital rotation completes one period of the stack

Compensation of individual emission profiles of the magnetrons by precalculating the orbital rotation profiles

Magnetron Sputtering utilizes plasma ion bombardment on a target to deposit thin films on the substrate surface.

Detailled Information

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