NanoSpace
Versatile System for Optimized Performance at Ultra-High Vacuum
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Versatile System for Optimized Performance at Ultra-High Vacuum
Local metal deposition and selective etching with UHV-compatible GIS.
Seamless connection to third-party UHV systems such as MBE clusters, APT chambers, or synchrotron beamlines.
Full UHV design - Contamination free environment
Tescan NanoSpace is the first UHV-designed FIB-SEM instrument, fully bakeable to reach the ultimate vacuum level.
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