NEXUS IBE Ion Beam Etch System
Unsurpassed Uniformity over Multiple Energy and Process Angles
广西科米瑞实验仪器设备有限公司生产销售 Veeco NEXUS IBE Ion Beam Etch System,可提供产品参数、报价和售后服务咨询,价格面议。
← 返回产品列表:Unsurpassed Uniformity over Multiple Energy and Process Angles
:Maximize slider yields and achieve excellent ion beam etch uniformity with the NEXUS® IBE™ Ion Beam Etching System. The IBE System offers unsurpassed uniformity over a wide range of energy and process angles, making it ideal for etch depth control of next-generation ABS step and cavity processing.
:Superior uniformity and improved etch depth control
:Highest throughput and reduced footprint for lowest cost of ownership
:Easily integrates with common technologies on world-class NEXUS hardware and software platform
:NEXUS Ion Source improves etch uniformity and process repeatability
:Also available with RF350 source for operations that have process-qualified use of RF350 source
:Platform can be cost-effectively field-upgraded to NEXUS Ion Source
请填写必填信息,我们将在工作日尽快回复。