WEP CVP21 晶圆掺杂剖面仪
WEP ControlCVP21CVP21 Wafer Profiler 通过 Electrochemical Capacitance Voltage Profiling 测量半导体层中的掺杂剖面。
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CVP21 Wafer Profiler 通过 Electrochemical Capacitance Voltage Profiling 测量半导体层中的掺杂剖面。
View specifications & applicationsShare the product, model, quantity and application requirements.