PVD-BATCH DRUM
The Kurt J. Lesker Company PVD-BATCH DRUM SERIES consists of two standard sizes (PVD 200 AND PVD 500), which can be configured in either a horizontal or vertical configuration. ...
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:The Kurt J. Lesker Company PVD-BATCH DRUM SERIES consists of two standard sizes (PVD 200 AND PVD 500), which can be configured in either a horizontal or vertical configuration. A horizontal configuration is preferred where particulate is a major concern. Both horizontal and vertical configurations are available with dual axis rotation for 3D coatings. Throughput, measured by deposition area per run, can range from a few hundred square inches to over 2000 square inches, and larger custom systems are also available.
:Automate Your Lab.
:PVD 200 Drum Coater Horizontal Or Vertical Drum (Horizontal Shown)
:PVD 500 Drum Coater Horizontal Or Vertical Drum (Vertical Shown)
:Specifications
:PVD 200 Drum Coater
:PVD 500 Drum Coater
:Horizontal or Vertical
:Deposition Zone
:Up To 300 sq/in Of Deposition Area (Overall Drum = 9" OD x 15" LG)
:Up To 1,440 sq/in Of Deposition Area (Overall Drum = 30.5" OD x ≈21" LG)
:Substrate Manipulation
:Heating, Cooling, Bias, Removable Panels
:Single and Dual Axis Rotation For 3D Components
:Ion Etch Option
:Source Capacity
:Up to (4) Sides Available for Linear Cathodes or a Linear Ion Source
:Up to (7) Sides Available for Linear Cathodes or a Linear Ion Source
:Power Supplies
:DC, PDC, RF, MF and HIPPIMS Power Supplies
:Source Accessibility
:Easy Access to Sputter Sources Through Drop-down/Hinged Doors
| 型号 | PVD-BATCH DRUM |
|---|---|
| Product category | Thin Film Deposition System |
| DRUM | DRUM Size / Effective Deposition Zones / Total Number Of 1" Substrates Per Effective Zone/Total DRUM |
| PVD 200 | 9" OD Diameter x 15" H / (5) 6" Wide / 48/240 |
| PVD 500 | 30.5" OD Diameter x 20.87" H / (8) 12.5" Wide / 153/1224 |
| 技术规格 4 | Deposition Zone |
| 技术规格 5 | Up To 300 sq/in Of Deposition Area (Overall Drum = 9" OD x 15" LG) |
| 技术规格 6 | Up To 1,440 sq/in Of Deposition Area (Overall Drum = 30.5" OD x ≈21" LG) |
| 技术规格 7 | Substrate Manipulation |
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| 技术规格 8 | Source Capacity |
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| 技术规格 9 | Up to (4) Sides Available for Linear Cathodes or a Linear Ion Source |
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| 技术规格 10 | Up to (7) Sides Available for Linear Cathodes or a Linear Ion Source |
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