Cassette Loading RIE Plasma Etching System RIE-200C
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反应离子刻蚀。High throughput system。The RIE-200C is a cassette type system for mass production, developed based on our experience with the CCP RIE system "RIE-10NR", which has an abu
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反应离子刻蚀
Cassette Loading RIE Plasma Etching System RIE-200C
Cassette Loading RIE Plasma Etching System RIE-200CHigh throughput system
The RIE-200C is a cassette type system for mass production, developed based on our experience with the CCP RIE system "RIE-10NR", which has an abundant delivery record. This system is capable of high-precision etching and ashing of various silicon thin films such as Si, Poly-Si, SiO₂, SiN, etc. It achieves high throughput by employing a two-cassette, double-arm robot, fully automatic operation by PLC control, and high performance to store process parameters.
主要特点和优点
Atmospheric high speed transfer system
This system is equipped with an atmospheric cassette chamber and an atmospheric transfer robot instead of the usual load lock chamber. It can handle automatic processing of up to ø8" wafers and can be installed in two cassettes.
Fully automatic operation
Operation is fully automated with a touch panel, and process management and data logging are possible with PLC control.
High-precision etching of various silicon thin films such as Si, Poly-Si, SiO₂, SiN, etc.
Photoresist ashing, stripping, and descuming
Removal of organic contaminants
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