EVG ® 610
Mask Alignment System。The is a compact and multi-purpose R&D system that can handle small substrate pieces and wafers up to 200 mm.
查看详情
EVG ® 620 NT
Mask Alignment System (semi-automated / automated)。The provides state-of-the art mask alignment technology on a minimized footprint area up to 150 mm wafer s...
EVG ® 6200 NT
Mask Alignment System (semi-automated / automated)。The mask aligner is a versatile tool for optical double-side lithography and wafer sizes up to 200 mm.