产品中心

Stirred Reactors

Series 4540 High Pressure Reactors, 600 & 1200 mL。Series 4550 Floor Stand Reactors, 1 & 2 Gallons

Series 2500 Micro Batch Reactor System

Parr Instrument Company is pleased to introduce our smallest ever family of stirred reactors, available in a number of configurations. With reactor volumes of 5 mL or 10 mL, ind...

Series 5000 Multiple Reactor System

The Parr Series 5000 Multiple Reactor System has been designed to provide an integrated system for running multiple reactions simultaneously and applying the principles of high ...

5400 Continuous Flow Tubular Reactors

Tubular reactors are used in continuous flow mode with reagents flowing in and products flowing out. They can be the simplest of all reactor designs. Tubular reactors are often ...

5420 Continuous Flow Tubular Reactor with Touchscreen Control

Parr's new Continuous Flow Tubular Reactor with Touchscreen Control was designed with researchers in mind. In addition to accommodating Parr's standard line of 5400 Tubular Reac...

AIXTRON AIX G5 WW C 碳化硅化合物半导体沉积系统

将 AIX G5 WW C 定义为化合物半导体沉积系统，面向下一代 SiC 功率电子应用。写明该系统以批量外延的高吞吐量结合单片晶圆控制，目标是在同一设备方案中兼顾产能和外延层质量

型号

AIX G5 WW C

应用材料

SiC

工艺方向

批量外延与单片晶圆控制

配置

8x150 mm，单片晶圆旋转

ASM International XP4 EmerALD 原子层沉积系统

XP4 EmerALD 是 ASM 官网列出的 ALD 工艺模块，用于沉积薄的共形金属层和介电层，适用于先进 CMOS 栅堆栈等应用。

型号

XP4 EmerALD

产品名称

XP4 EmerALD®

产品说明

EmerALD is a process module designed to deposit thin conformal metal and dielectric ​layers by atomic layer deposition (ALD) used for advanced CMOS gate stacks and other applications.

ASM International XP4 Pulsar 原子层沉积系统

Pulsar 反应器用于支持铪基高 k 介电材料在晶体管栅极中的应用，并用于满足 finFET 等先进节点三维晶体管结构的性能要求。Pulsar 反应腔和源输送系统针对精确气流动态和最短吹扫时间进行了优化，支持先进工艺控制、薄膜纯度和均匀性

型号

XP4 Pulsar

产品名称

XP4 Pulsar®

产品说明

Pulsar uses ALD to deposit the high-k dielectric materials required for advanced CMOS transistor high-k metal gates ​and other applications. Our most advanced Pulsar reactor is the AXIS, which includes a series of reactor improvements resul

ASM International XP8 Synergis 热 ALD 系统

XP8 Synergis 是用于多种热 ALD 应用的高生产率设备，可配置最多四个双腔模块，在紧凑占地内支持八个腔体。规格参数 型号：XP8 Synergis。产品名称：XP8® Synergis®。产品说明摘

型号

XP8 Synergis

产品名称

XP8® Synergis®

产品说明

Synergis® is a high-productivity tool for a wide range of thermal ALD applications. The Synergis system can be configured with up to four Dual Chamber Modules (DCM), enabling eight chambers in high volume production, within a very compact f

ASM International XP8 DCM PEALD 等离子体增强原子层沉积系统

XP8 DCM PEALD 是面向先进半导体应用的 300 mm 高生产率等离子体增强原子层沉积系统。规格参数 型号：XP8 DCM PEALD。产品名称：XP8® DCM™ PEALD。​X

型号

XP8 DCM PEALD

产品名称

XP8® DCM™ PEALD

产品说明

​XP8® DCM™ is a high-productivity 300 mm plasma-enhanced atomic layer deposition (PEALD) system designed for advanced semiconductor applications. Configurable with up to four Dual Chamber Modules (DCM), it supports eight reaction chambers f

ASM International XP8 QCM PEALD 等离子体增强原子层沉积系统

XP8 QCM PEALD 面向先进节点存储器和逻辑应用，支持硅氧化物和硅氮化物等介电 PEALD 工艺。规格参数 型号：XP8 QCM PEALD。产品名称：XP8® QCM PEALD。X

型号

XP8 QCM PEALD

产品名称

XP8® QCM PEALD

产品说明

XP8 QCM is a PEALD tool focused on advanced node memory and logic applications. It is capable of a broad range of dielectric PEALD processes, including silicon oxide and silicon nitride.

ASM International XP8 JQCM PEALD 等离子体增强原子层沉积系统

XP8 JQCM PEALD 支持每个平台最多四个独立四腔工艺模块，每个模块集成四个反应腔。反应器设计用于提高前驱体效率、减少 ALD 循环时间，并支持低温沉积高质量 SiN 薄膜

型号

XP8 JQCM PEALD

产品名称

XP8® JQCM™ PEALD

产品说明

XP8® JQCM™ is a high-performance 300 mm plasma-enhanced atomic layer deposition (PEALD) system, purpose-built for advanced silicon nitride (SiN) deposition in logic semiconductor manufacturing. Engineered for next-generation device fabricat