细胞、分子、生物制药、培养与成像
显微镜、成像系统、光学平台与光学测量
消解、萃取、浓缩、纯化、研磨与进样
加热、恒温、干燥、制冷、水浴、烘箱与培养箱
真空系统、泵、阀、气体、流量与液体处理
材料表征、热分析、力学、粒度、表面和物性测试
天平、搅拌、摇床、清洗、灭菌、工作台和常规设备
半导体、电子测量、电源、电池、探针台与微纳加工
实验室工程、配套系统、家具、管路与辅助系统
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The OAI Model 2000 Exposure Systems may be configured as either an Edge-Bead Exposure System (2000SM) or a Flood Exposure System (2000AF); both configurations are based on OAI’s...
For Production Semiconductors, MEMS, Sensors, Advanced Packaging, IOT, Microfluidics
For Glass Panel Exposure。The Large Substrate Exposure System is designed for markets requiring exposure of large glass panels. Using OAI’s advanced beam optics, the system utilize
Dependable and repeatable, the OAI Model 308 UV Light Meter is a precise, direct-reading instrument designed to measure UV light intensity. The Model 308 features detachable pro...
Built for high intensity applications, the OAI Model 308T UV Light Meter is a dependable, direct-reading instrument designed for measuring UV light intensity for UV curing. The ...
UV Light and Energy Meter for use with all wafer steppers Datasheet
UV Ozone Treatment System Plus improves surface adhesion.。■ UV Ozone Treatment Systems available for R&D through production
Perfect for a wide variety of industries where the precise measurement of UV energy is essential, the Model 356 is designed for any application requiring repeatable, reliable UV...
UV Intensity & Energy Meter。Designed for use with ASML, Canon, Nikon and GCA & Rudolph Technology Wafer Steppers the Model 457 UV Light Intensity & Energy System accurately profil
高分辨率X射线衍射（HRXRD）与X射线反射（XRR）系统，可实现非图案化外延薄膜的厚度、密度、表面/界面粗糙度、成分分布、应变、弛豫状态及倒易空间映射（RSM）的多维度表征。系统具备全晶圆映射能力，可覆盖直径达300mm的晶圆，适用于半导体制造的近厂（Near-Fab）应用场景。
X射线形貌（XRT）成像系统，可针对功率电子、光电子及5G/6G通信领域的核心半导体材料（碳化硅（SiC）、氮化镓（GaN）、砷化镓（GaAs）、磷化铟（InP）、氧化镓（Ga₂O₃））开展单晶缺陷可视化表征，支持直径达300mm的晶圆测试。
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一款新型全集成电子衍射仪，用于测量亚微米级晶体，支持从数据采集到晶体结构确定的体系化工作流程。产品线：Single Crystal、Electron Diffraction
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